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核聚变与等离子体物理 ›› 2025, Vol. 45 ›› Issue (3): 349-356.DOI: 10.16568/j.0254-6086.202503014

• 等离子体物理 • 上一篇    下一篇

等离子体辐照下钨表面氘致起泡行为分析

元梦辉,罗忠帆,客振华,朱秀丽   

  1. (华北电力大学,北京 102206)
  • 收稿日期:2023-10-16 修回日期:2024-05-21 出版日期:2025-09-15 发布日期:2025-09-29
  • 通讯作者: 朱秀丽(1989-),女,安徽安庆人,副教授,硕士研究生导师,从事核聚变等离子体与材料相互作用研究。
  • 作者简介:元梦辉(2004-),男,山西晋城人,本科生,从事等离子体与材料相互作用实验研究。
  • 基金资助:
    北京市自然科学基金(1242029);中央高校基本科研业务费专项资金(2024MS053)

Analysis of deuterium-induced blistering in tungsten after plasma exposure

YUAN Meng-hui, LUO Zhong-fan, KE Zhen-hua, ZHU Xiu-li   

  1. (North China Electric Power University, Beijing 102206)
  • Received:2023-10-16 Revised:2024-05-21 Online:2025-09-15 Published:2025-09-29

摘要:

借助扫描电子显微镜和专业图像分析软件,研究了多组辐照参数下低能大束流等离子体辐照后钨材料的晶内和晶间氘致起泡行为,同时结合热脱附谱测试方法,对比了氘滞留量随辐照参数的变化。当前实验结果显示,低温辐照时,辐照剂量增加导致晶内泡数密度显著上升、尺寸分布趋势和平均尺寸变化不大;晶间泡数密度显著增加、尺寸分布范围变宽、甚至会有微米泡出现。辐照剂量一定时,辐照温度升高导致晶内泡数密度显著增加、平均尺寸有所下降,晶间泡数密度和平均尺寸均增加。相比于辐照剂量,氘致起泡行为对辐照温度更为敏感。氘滞留结果表明,低温辐照下的辐照剂量增加,氘滞留变化微弱;辐照温度升高到500 K 以上时,氘滞留增加显著,主要表现为中高温脱附峰强度增强。起泡行为与氘滞留的对比结果表明,晶内泡数密度的显著增多对氘滞留总量的贡献很小,而晶间泡数密度的显著增多和尺寸增大可显著影响氘滞留行为,主要表现为氘扩散深度增强、高能捕获的氘滞留量显著增多。

关键词: 面对等离子体材料, 钨, 等离子体辐照, 表面起泡, 氘滞留

Abstract:

In this work, the intra-granular and inter-granular deuterium-induced blistering behavior of tungsten materials exposed to low-energy and high-flux deuterium plasma was investigated under different sets of exposure parameters via scanning electron microscope and professional image analysis software. The changes in deuterium retention with exposure parameters were also compared after thermal desorption spectroscopy (TDS) measurements. The present experimental results show that in the low-temperature exposure, the increase in exposure fluence leads to a significant increase in the intra-granular blister density with little change in the size distribution trend and average size, while for the inter-granular blisters, the increased exposure fluence gives rise to a significant increase in blister density, a wider range of size distribution and even the appearance of micrometer-sized blisters. For a given exposure fluence, the increased exposure temperature leads to a significant increase in the number density and a decreased average size of both intra- and inter- granular blisters. It is evident that the behavior of deuterium-induced blistering is more sensitive to the exposure temperature than to the fluence. The TDS results show that the deuterium retention increases slightly with increasing irradiation dose at low irradiation temperatures; when the irradiation temperature is increased above 500 K, the deuterium retention increases significantly, which is mainly reflected by the increase in the intensity of the medium and high-temperature peaks. The comparison between blistering and deuterium retention shows that the significant increase in intra-granular blistering contributes very little to the total deuterium retention, whereas the increase and growth of intergranular blistering can significantly affect the deuterium retention, mainly due to the enhancement of the deuterium diffusion depth and the significantly increased amount of the high-energy trapped deuterium.

Key words: Plasma-facing materials, Tungsten, Plasma exposure, Surface blister, Deuterium retention

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