Abstract: The plasma parameters in an rf-biased ECR-PECVD have been measured using double Langmuir probes．The effect of microwave power, magnetic electrical curent and gas pressure on the plasma parameters in ECR-PECVD under rf biasing have also been measured．The results indicate that the rf biasing in our dual ECR-rf configuration enhances the electron temperature,but the plasma density is mainly affected by ECR．

Key words: ECR-PECVD, Rf-bias, Double probe, Electron temperature, Plasma density

摘要： 利用双探针对 ECR-PECVD 装置中基片在射频偏置下的等离子体参数进行了测量。同时测量了在射频偏置下微波功率、磁场电流、进气量等参数对 ECR-PECVD 等离子体参数的影响。结果表明，在 ECR-PECVD 等离子体装置中，基片射频偏置对电子温度有影响，而等离子体密度主要由微波功率所决定。

关键词: ECR-PECVD, 射频偏置, 双探针, 电子温度, 等离子体密度