C+轰击铍的分子动力学模拟

核聚变与等离子体物理 ›› 2011, Vol. 31 ›› Issue (3): 207-212.

C⁺轰击铍的分子动力学模拟

孙伟中1，赵成利2，张浚源1，陈峰2，潘宇东3，苟富均1, 4

(1. 四川大学原子核科学技术研究所，辐射物理及技术教育部重点实验室，成都 610064； 2. 贵州大学等离子体与材料表面作用研究所，贵阳550025； 3. 核工业西南物理研究院，成都 610041；4. 荷兰皇家科学院等离子体所，荷兰 2300)

收稿日期:2010-09-29 修回日期:2010-11-15 发布日期:2011-09-15
作者简介:孙伟中(1986-)，男，江苏盐城人，硕士研究生，主要从事等离子体与材料表面相互作用的研究。
基金资助:
国际热核聚变实验堆(ITER)计划专项(2009GB104006)；贵州省优秀青年科技人才培养计划资助课题(700968101)

Molecular dynamics simulation of beryllium bombardment with C⁺

SUN Wei-zhong1, ZHAO Cheng-li2, ZHANG Jun-yuan1, CHEN Feng2, PAN Yu-dong3, GOU Fu-jun 1, 4

(1. Key Laboratory of Radiation Physics and Technology Sichuan University, Ministry of Education, Institute of Nuclear Science and Technology, Sichuan University, Chengdu 610064; 2. Institute of Plasma Surface Interactions, Guizhou University, Guiyang 550025; 3. Southwestern Institute of Physics, Chengdu 610041; 4. Institute of Plasma Physics Royal Netherlands Academy of Arts and Sciences, 2300, Netherlands)

Received:2010-09-29 Revised:2010-11-15 Published:2011-09-15

摘要/Abstract

摘要：

使用分子动力学模拟方法研究了入射能量对C⁺离子与Be样品表面相互作用的影响。模拟结果表明，随着C⁺离子的入射能量增大，C⁺离子注入深度也增加，Be原子的溅射产额近似线性增加，而滞留在样品中的C原子数量变化不大，在C⁺离子轰击Be样品的初始阶段，样品中Be原子的溅射产额较大，而随着C⁺离子注入剂量的增加，Be原子的溅射产额逐渐减小并趋于稳定。在此作用过程中，在样品表面形成一个富C层，减缓了样品中Be原子的溅射速率，起到了保护Be样品的作用。

关键词: 分子动力学, 入射能量, 溅射, 滞留, 富C层

Abstract:

Molecular dynamic simulations were performed to study the effect of the incident energy on the interreaction of C⁺ ion with Be sample surface. The simulated results show that with increasing C⁺ incident energy, the C⁺ implantation depth increases and the sputtering yield of Be increases near-linearly. However, the retention rate of C in the sample slightly changes. During the initial stage of the C⁺ bombarding Be sample, the sputtering yield of Be in sample increases sharply. With increasing exposure to C⁺, the sputtering yield of Be decreases and reaches saturation gradually. It is found that the formation of a carbon-rich layer near the sample surface region can protect beryllium sample from sputtering.

Key words: Molecular dynamics, Incident energy, Sputtering, Retention, Carbon-rich layer

中图分类号:

TL62+7

孙伟中1，赵成利2，张浚源1，陈峰2，潘宇东3，苟富均1, 4. C⁺轰击铍的分子动力学模拟[J]. 核聚变与等离子体物理, 2011, 31(3): 207-212.

SUN Wei-zhong, ZHAO Cheng-li, ZHANG Jun-yuan, CHEN Feng, Pan Yu-dong, GOU Fu-jun. Molecular dynamics simulation of beryllium bombardment with C⁺[J]. NUCLEAR FUSION AND PLASMA PHYSICS, 2011, 31(3): 207-212.

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