高功率脉冲非平衡磁控溅射放电特性和参数研究

核聚变与等离子体物理 ›› 2010, Vol. 30 ›› Issue (4): 365-369.

高功率脉冲非平衡磁控溅射放电特性和参数研究

牟宗信，王春，贾莉，牟晓东，藏海荣，刘冰冰，董闯

(三束材料改性教育部重点实验室，大连理工大学物理与光电工程学院，大连 116024)

收稿日期:2010-03-12 修回日期:2010-09-29 出版日期:2010-12-15 发布日期:2011-01-26
作者简介:牟宗信(1969-)，男，山东日照人，副教授，从事低温等离子体应用研究。
基金资助:
国家自然科学基金资助项目(50407015)；辽宁省教育厅资助科研项目

Study of discharge properties and parameters of high power pulsed unbalanced magnetron sputtering

MU Zong-xin, WANG Chun, JIA Li, MU Xiao-dong, ZANG Hai-rong, LIU Bing-bing, DONG Chuang

(Key Laboratory of Materials Modification by Laser, Ion and Electron Beams, Ministry of Education, School of Physics and Optoelectronic technology, Dalian University of Technology, Dalian 116024)

Received:2010-03-12 Revised:2010-09-29 Online:2010-12-15 Published:2011-01-26

摘要/Abstract

摘要：

用线圈电流控制非平衡磁场，用汤森放电击穿形成深度自触发放电，用磁阱捕获放电形成的二次电子和导致漂移电流，形成了高功率非平衡磁控溅射放电。采用偏压为-100V相对磁控靶放置的圆形平面电极收集饱和离子电流；在距离磁控靶14cm的位置由Langmuir探针测量浮置电位；示波器测量磁控靶的脉冲电压、电流、浮置电位和饱和离子电流信号。装置的放电脉冲功率达到0.9MW，脉冲频率最大值为40Hz左右，空间电荷限制条件是控制电子电流和离子电流的主要机制。

关键词: 磁控溅射, 放电, 脉冲技术

Abstract:

The deep extent discharge has been formed by spontaneous transcend discharge. The magnetic trap above target captures the second electrons leading to a drift current. A circular planar electron biased -100V opposite to target was used to measure saturation ion current. A Langmuir probe located at 14cm from target was used to measure floating potential. An oscilloscope was used to pick the pulsed signal of discharge voltage, current, float potential and saturation ion current. The pulsed discharge power reached above 0.9MW, and a peak frequency value is about 40Hz. The limited condition of space charge is the control mechanism for the electron current and ion current respectively.

Key words: Magnetron sputtering, Discharge, Pulsed technology

中图分类号:

O539

牟宗信，王春，贾莉，牟晓东，藏海荣，刘冰冰，董闯. 高功率脉冲非平衡磁控溅射放电特性和参数研究[J]. 核聚变与等离子体物理, 2010, 30(4): 365-369.

MU Zong-xin, WANG Chun, JIA Li, MU Xiao-dong, ZANG Hai-rong, LIU Bing-bing, DONG Chuang. Study of discharge properties and parameters of high power pulsed unbalanced magnetron sputtering[J]. NUCLEAR FUSION AND PLASMA PHYSICS, 2010, 30(4): 365-369.

参考文献

[1] Kouznetsov V, Maca K, Schneider J M, et al. A novel pulsed magnetron sputter technique utilizing very high target power densities[J]. Surface and Coatings Technology, 1999, 122: 290.

[2] Ehiasarian A P, New R, Münz W D. Influence of high power densities on the composition of pulsed magnetron plasmas[J]. Vacuum, 2002, 65: 147.

[3] Christiea D J. Target material pathways model for high power pulsed magnetron sputtering[J]. J. Vac. Sci. Techn., 2005, A23: 330.

[4] Bohlmark J, Lattemann M, Gudmundsson J T, et al. The ion energy distributions and ion flux composition from a high power impulse magnetron sputtering discharge
[J]. Thin Solid Films, 2006, 515: 1522.

[5] Anders A, Andersson J, Ehiasarian A. High power impulse magnetron sputtering: current-voltage-time characteristics indicate the onset of sustained self- sputtering
[J]. J. Appl. Phys., 2007, 102: 113303.

[6] Andersson J, Ehiasarian A P, Anders A. Observation of Ti⁴⁺ ions in a high power impulse magnetron sputtering plasma[J]. Appl. Phys. Lett., 2008, 93: 071504.

[7] Helmersson U, Lattemann M, Bohlmark J, et al. Ionized physical vapor deposition (IPVD): a review of tech- nology and applications[J]. Thin Solid Films, 2006, 513: 1–24.

[8] Sarakinos K, Alami J, Konstantinidis S. High power pulsed magnetron sputtering: a review on scientific and engineering state of the art[J]. Surface and Coatings Technology, 2010, 204: 1661–1684.

[9] Thornton J A. Magnetron sputtering: basic physics and application to cylindrical magnetrons[J]. J. Vac. Sci. Techn., 1978, A15:171.

[10] Windows B, Savvides N. Charged particle fluxes from planar magnetron sputtering sources[J]. J. Vac. Sci. Techn., 1986, A4: 196.

[11] Rossnagel S M. Induced drift currents in circular planar magnetrons[J]. J. Vac. Sci. Techn., 1987, A5(1): 88− 91.

[12] 牟宗信, 李国卿, 黄开玉. 同轴磁场对非平衡磁控溅射系统放电特性的影响[J]. 核聚变与等离子体物理, 2004, 24(2): 141-146.

[13] Pekker L, Krasheninnikov S I. On the theory of low-pressure magnetron glow discharge[J]. Physics of Plasma, 2000, 7: 382.

[14] 牟宗信, 李国卿, 车德良. 非平衡磁控溅射沉积系统伏安特性模型研究[J]. 物理学报, 2004, 53: 1994.

[15] Bradley J W, Cecconello M. Measurement of the plasma potential in a magnetron discharge and the prediction of the electron drift speeds[J]. Plasma Sources Science and Technology, 2001, 10: 49.

[16] 菅井秀郞. 等离子体电子工程学[M]. 北京: 科学出版社，2002.

[17] 迈克尔 A 力伯曼, 阿伦 J 里登伯格. 等离子体放电原理与材料处理[M]. 北京: 科学出版社, 2007.

[18] 刘锡三. 高功率脉冲技术[M]. 北京: 国防工业出版社, 2005.

[19] 米夏兹. 真空放电物理和高功率脉冲技术[M]. 北京: 国防出版社, 2007.

[20] Christie D J, Tomasel F, Sproul W D, et al. Power supply with arc handling for high peak power magnetron sputtering [J]. J. Vac. Sci. Techn., 2004, A22: 1415.