用在线椭偏仪研究非晶碳氢膜沉积和刻蚀过程

核聚变与等离子体物理 ›› 2007, Vol. 27 ›› Issue (2): 163-167.

用在线椭偏仪研究非晶碳氢膜沉积和刻蚀过程

孙超，徐军，马腾才

(大连理工大学三束材料改性国家重点实验室，大连 116024)

收稿日期:2006-04-04 修回日期:2006-07-13 出版日期:2007-06-15 发布日期:2011-08-23
作者简介:孙超（1972-），男，辽宁大连人，博士生, 讲师，主要从事等离子体薄膜制备和诊断的研究。
基金资助:
国家留学基金委留学基金资助

Deposition and erosion study on amorphous hydrocarbon films by in situ ellipsometry

SUN Chao, XU Jun, MA Teng-cai

(State Key Lab of Materials Modification by laser, electron and ion beams, Dalian University of Technology, Dalian 116024)

Received:2006-04-04 Revised:2006-07-13 Online:2007-06-15 Published:2011-08-23

摘要/Abstract

摘要：

利用在线椭偏仪对非晶碳氢膜进行了光学常数、沉积率和刻蚀率的测量。在无直流负偏压或偏压较小时，薄膜呈现聚合物结构，折射率和消光系数较小；当增加直流负偏压时，薄膜的折射率和消光系数显著提高，所成膜为硬质非晶碳氢膜。在以CH₄作为气源进行沉积时，随着偏压的增加，沉积率先升高再降低，在偏压为-100V时，沉积率为最大。H₂/N₂(30% N₂)的混合气体的刻蚀率要比单独用H₂作为刻蚀气体的刻蚀率要大。对于CH₄/N₂ (30% N₂)，在偏压从0V增加到300V过程中，在大约50V时，基底上的薄膜有一个从沉积到刻蚀的转化过程。

关键词: 椭偏仪, 非晶碳氢膜, 沉积, 刻蚀, 光学参数

Abstract:

The deposition and erosion of amorphous hydrocarbon films by a methane plasma with O₂, H₂, H₂/N₂(30% N₂) and CH₄/N₂ (30% N₂) are investigated by in situ ellipsometry. RF bias voltage could make effects on the optical properties of amorphous hydrocarbon films, actually the refractive index and extinction coefficient increase with the increase of bias voltage. The deposition rate of methane plasmas increases when the bias voltage increases from floating potential to 100V, then it decreases from 100V to 200V. Erosion is most effective in pure O₂ plasma. For the erosion experiments using CH₄/N₂ mixtures, transition from deposition to erosion was observed when bias voltage increased from zero to 300V.

Key words: Ellipsometry, Amorphous hydrocarbon films, Deposition, Erosion, Optical parameter

中图分类号:

O539

孙超，徐军，马腾才. 用在线椭偏仪研究非晶碳氢膜沉积和刻蚀过程[J]. 核聚变与等离子体物理, 2007, 27(2): 163-167.

SUN Chao, XU Jun, MA Teng-cai. Deposition and erosion study on amorphous hydrocarbon films by in situ ellipsometry[J]. NUCLEAR FUSION AND PLASMA PHYSICS, 2007, 27(2): 163-167.

参考文献

[1] Angus J C, Koidl P, Domitz S. Plasma deposited thin films[M]. Boca Raton, FL, CRC Press, 1986. 89.

[2] Keudell A Von, Meier M, Hopf C. Growth mechanism of amorphous hydrogenated carbon[J]. Diamond and Related Materials, 2002, 11: 969-975.

[3] Jacob W. Surface reactions during growth and erosion of hydrocarbon films[J]. Thin Solid Films, 1998, 326: 1-42.

[4] 黄佐华.自动椭偏测厚仪测量精确度的实验研究[J]. 机电工程技术, 2004, 33(4): 18-20.

[5] 梁海锋，严一心. 类金刚石薄膜光学特性的椭偏法研究[J]. 真空科学与技术学报, 2005, 25(4): 287-289.

[6] Tabares F L, Tafalla D. Plasma physics control fusion, hydrogen traooing in carbon films deposited in the presence of radical and ion scavengers[J]. Physica Scripta, 2003, 103: 7-50.

[7] Tabares F L, Tafalla D, Tanarro I, et al. Suppression of hydrogenated carbon film deposition by scavenger techniques and their application to the tritium inventory control of fusion devices[J]. Plasma Physics and Controlled Fusion, 2002, 44: L37-42.

[8] 胡建生, 辜学茂, 王小明, 等. HT-7超导托卡马克装置真空系统参数的标定及分析[J]. 真空科学与技术学报, 2004, 24(2): 149-153.

[9] Landkammer B, Keudell A Von, Jacob W. Erosion of thin hydrogenated carbon films in oxygen, oxygen/ hydrogen and water plasmas[J]. J. Nucl. Mater., 1999, 264: 48-55.

[10] 王洪涛. 椭圆偏振法得到薄膜参量的数据处理[J]. 物理实验, 2001, 21(7): 8-11.

[11] 陈篮, 周岩. 膜厚度测量的椭偏仪法原理分析[J]. 大学物理实验, 1999, 12(3): 10-13.

[12] Azzam R M A, Bashara N M. Ellipsometry and polarized light[M]. Amsterdam: North-Holland, 1977.

[13] Keudell A Von, Jacob W. Growth and erosion of hydrocarbon films investigated by in situ elliosometry[J]. J. Appl. Phys., 1996,79(2): 1092-1098.

[14] Robertson J. Diamond-like amorphous carbon[J]. Material Science and Engineering, 2002, 37: 129-281.

[15] 李红轩. 直流负偏压对类金刚石薄膜结构和功能的影响[J]. 材料科学与工程学报, 2003, 21(6): 802-805.

[16] Schwarz-Seilinger T, Keudell A Von, Jacob W. Plasma chemical vapor depositon of hydrocarbon films: the influence of hydrocarbon source gas on the film properties[J]. J. Appl. Phys., 1999, 86(7): 3988 -3996.

[17] Hopf Ch, Keudell A Von, Jacob W. Chemical sputtering of hydrocarbon films[J]. J. Appl. Phys., 2003, 94(4): 2373-2380.