[1] Osipov I, Rempe N. A plasma-cathode electron source designed for industrial use [J]. Rev. Sci. Instrum., 2000,71(4): 1638-1641.
[2] Hirt L, Reiser A, Spolenak R, et al. Additive manufacturing of metal structures at the micrometer scale[J]. Advanced Materials, 2017, 29(17): 1604211.
[3] Galchenko N K, Kolesnikova K A, Semenov G V, et al.Application of electron beam equipment based on a plasma cathode gun in additive technology [C]. AIP Publishing LLC, 2016. 020059.
[4] Pedrini D, Albertoni R, Paganucci F, et al. Modeling of LaB6 hollow cathode performance and lifetime [C]. 64thInternational Astronautical Congress, 2015. 170-178.
[5] Ozur G E, Proskurovsky D I, Rotshtein V P, et al.Production and application of low-energy, high-current electron, beams [J]. Laser & Particle Beams, 2003, 21(2):157-174.
[6] Oks E M. Plasma cathode electron sources: physics,technology, applications [M]. Wiley VCH, 2006.
[7] Dan M G, Katz I. Fundamentals of electric propulsion:ion and hall thrusters [M]. California: John Wiley & Sons,Inc., 2008.
[8] Kornilov S Y, Osipov I V, Rempe N G. Generation of narrow focused beams in a plasma-cathode electron gun
[J]. Instruments & Experimental Techniques, 2009, 52(3):406-411.
[9] Oks E M, Schanin P M. Development of plasma cathode electron guns [J]. Phys. Plasmas, 1999, 6(5): 1649-1654.
[10] Zhirkov I S, Burdovitsin V A, Oks E M, et al. Formation of narrow-focused electron beams generated by a source with a plasma cathode in the forevacuum pressure range[J]. Technical Physics, 2006, 51(6): 786-790.
[11] Muhl S, Pérez A. The use of hollow cathodes in deposition processes: a critical review [J]. Thin Solid Films, 2015, 579: 174-198.
[12] Cothran C D, Boris D R, Compton C S, et al. Continuous and pulsed electron beam production from an uninterrupted plasma cathode [J]. Surface & Coatings Technology, 2015, 267: 111-116.
[13] 张连珠, 傅凤清, 王增波, 等. 氮气空心阴极辉光放电等离子体离子的蒙特卡罗模拟研究 [J]. 核聚变与等离子体物理, 2006, 26(2): 135-139.
[14] Vizir A, Gushenets V, Nikolaev A, et al. Recent development and applications of electron, ion and plasma sources based on vacuum arc and low pressure glow [C].The IEEE International Conference on Plasma Science,2004. Icops 2004. IEEE Conference Record. IEEE Xplore, 2004. 286.
[15] Oks E M. Physics and technique of plasma electron sources [J]. Plasma Sources Science & Technology, 1992,1(4): 249.
[16] Manheimer W M, Fernsler R F, Gitlin M S. High power,fast, microwave components based on beam generated plasmas [J]. IEEE Transactions on Plasma Science, 2002,26(5): 1543-1555.
[17] Xu J, Tian X, Gong C, et al. A plasma electron source for generating beam plasma at low gas pressures [J]. Vacuum,2017, 143: 407-411.
[18] Vizir A V, Oks E M, Shandrikov M V, et al. A bulk plasma generator based on a plasma cathode discharge [J].Instruments & Experimental Techniques, 2003, 46(3):384-387.
[19] Pozo S D, Ribton C N, Smith D R. A novel RF excited plasma cathode electron beam gun design [J]. IEEE Transactions on Electron Devices, 2014, 61(6):1890-1894.
[20] Longmier B, Hershkowitz N. "Electrodeless" plasma cathode for neutralization of ion thrusters [C]. AIAA 2005?3856, 41st Joint Propulsion Conference & Exhibit, Tucson, Arizona1, 2005.
[21] Goebel D M, Watkins R M. High current, low pressure plasma cathode electron gun [J]. Rev. Sci. Instrum., 2000,71(2): 388-398.
[22] Longmier B, Hershkowitz N. Improved operation of the nonambipolar electron source [J]. Rev. Sci. Instrum.,2008, 79(9): 113504-61.
[23] 刘明海, 胡希伟, 吴汉明. ECR 等离子体源中基本参数的数值模拟 [J]. 核聚变与等离子体物理, 1998, 18(2):36-40.
[24] 杨涓, 冯冰冰, 罗立涛, 等. 氩气和氪气作为ECR 中和器工质的性能比较 [J]. 高电压技术, 2015, 41(9):2850-2855.
[25] Light M, Madziwa-Nussinov T G, Colestock P, et al.Electron beam generation by an electron cyclotron resonance plasma [J]. IEEE Transactions on Plasma Science, 2009, 37(2): 317-326.
[26] Manheimer W M, Fernsler R, Lampe M, et al.Theoretical overview of the large area plasma processing system (LAPPS) [C]. IEEE International Conference on Plasma Science, 2000. Icops 2000. IEEE Conference Record. IEEE Xplore, 2000. 151.
[27] Weatherford B R, Foster J E, Kamhawi H. Electron current extraction from a permanent magnet waveguide plasma cathode [J]. Rev. Sci. Instrum., 2011, 82(9):093507.
[28] Takao Y, Hiramoto K, Nakagawa Y, et al. Electron extraction mechanisms of a micro ECR neutralizer [J].Japanese Journal of Applied Physics, 2016, 55(7S2):07LD09. |