N2-Ar射频放电表面氮化的等离子体特性模拟

核聚变与等离子体物理 ›› 2012, Vol. 32 ›› Issue (2): 128-132.

N₂-Ar射频放电表面氮化的等离子体特性模拟

孙倩，杨莹，赵海涛，郝莹莹，张连珠，赵国明

(1. 河北师范大学物理科学与信息工程学院，石家庄 050024；2. 河北正定中学，正定 050800)

收稿日期:2011-10-04 修回日期:2012-03-02 出版日期:2012-06-15 发布日期:2011-06-14
作者简介:孙倩(1986-)，女，河北衡水人，硕士研究生，从事低温等离子体物理研究。
基金资助:
河北省自然科学基金资助项目(A2012205072)

N₂-Ar rf discharge surface nitriding plasma characteristics simulation

SUN Qian, YANG Ying, ZHAO Hai-tao, HAO Ying-ying, ZHANG Lian-zhu, ZHAO Guo-ming

(1. College of Physical Science and Information Engineering, Hebei Normal University, Shijiazhuang 050024; 2. Hebei Zhengding Middle School, Zhengding 050800)

Received:2011-10-04 Revised:2012-03-02 Online:2012-06-15 Published:2011-06-14

摘要/Abstract

摘要：

N₂-Ar射频放电等离子体广泛应用于微电子工业的刻蚀、氮化物薄膜的制备及金属表面氮化等技术领域。开发了N₂-Ar混合气体容性耦合射频放电PIC/MC自洽模

型，模型主要描述了e^-，N₂⁺，N⁺，Ar⁺等主要带电粒子的行为分布。等离子体的碰撞过程分别考虑了带电粒子(e^-，N₂⁺，N⁺，Ar⁺)与基态中性N₂分子和Ar原子

的21种碰撞反应过程。模拟结果表明，在纯N₂及N₂-Ar混合气体容性耦合射频放电中，各种带电粒子的数密度都在等离子体区达到最大值，且氮分子离子为主要

粒子；在N₂容性耦合射频放电中，加入10%氩气时，N⁺平均能量有所增加，在射频电极处两种氮离子(N₂⁺，N⁺)高能粒子所占比例增加。本研究对认识N₂-Ar射

频放电等离子体过程微观机理具重要意义。

关键词: N₂-Ar射频放电, PIC/MC模型, 氮等离子体

Abstract:

N₂-Ar rf discharge plasma is used in numerous widespread applications, such as the etching in microelectronics industry, the preparation of nitrides film and the metal surface nitriding and so on. A PIC/MC model for the N2-Ar mixture gas capacitively coupled rf discharge processes was developed, in which we describe the behaviour of the main charged particles(e^-, N₂⁺, N⁺, Ar⁺)and take into account 21 kinds of collisions of charged particles(e^-, N₂⁺, N⁺, Ar⁺)with ground-state neutral N₂ and Ar. It turned out that however in the N₂-Ar mixture gas discharge or N₂ gas discharge, the density of charged particles all has the maximum in the plasma region, especially, N₂⁺ is the main particle. In the N₂ gas capacitively coupled rf discharge, with the adding of 10% Ar, the mean energy of N⁺ is increasing, and the high-energy proportion of the two particles (N₂⁺, N⁺) in the rf electrode are both increasing. So it was important for us to know the microscopic mechanism of N₂-Ar rf discharge.

Key words: N₂-Ar rf discharge, PIC/MC simulation, N₂ plasma

中图分类号:

O539

孙倩，杨莹，赵海涛，郝莹莹，张连珠，赵国明. N₂-Ar射频放电表面氮化的等离子体特性模拟[J]. 核聚变与等离子体物理, 2012, 32(2): 128-132.

SUN Qian, YANG Ying, ZHAO Hai-tao, HAO Ying-ying, ZHANG Lian-zhu, ZHAO Guo-ming. N₂-Ar rf discharge surface nitriding plasma characteristics simulation[J]. NUCLEAR FUSION AND PLASMA PHYSICS, 2012, 32(2): 128-132.

参考文献

[1] Bultinck E, Mahieu S, Depla D. Reactive sputter deposition of TiN_x films, simulated with a particle-in- cell/Monte Carlo collisions model [J]. New Journal of Physics, 2009, 11: 023039.

[2] Ricard A, Besner A, Hubert J, et al. High nitrogen atom yield downstream of an atmospheric pressure flowing Ar-N₂ microwave discharge [J]. J. Phys. B, At. Mol. Opt. Phys., 1988, 21: L579–L583.

[3] Sa P A, Loureiro J. A time-dependent analysis of the nitrogen afterglow in N₂ and N₂-Ar microwave discharges [J]. J. Phys. D, Appl. Phys., 1997, 30: 1320– 2330.

[4] Park M H, Kim S H. Thermal conductivity of AlN thin films deposited by RF magnetron sputtering [J]. Materials Science in Semiconductor Processing, 2011, 007.

[5] Ulrich S, Ye J. Influence of Ar-N₂ gas composition on the magnetron-sputter deposition of cubic boron nitride films [J]. Surf. Coat. Techn., 2010, 205: s96–s98.

[6] Depla D, Mahieu S. Reactive sputter deposition [J]. Spring Series in Materials Science, 2008, 109.

[7] Wrinski Z. Dissociation of nitrogen in the plasma- cathode interface of glow discharges [J]. Vacuum, 2005, 78: 641.

[8] Bogaerts A, Yan M, Gijbels R. Modeling of ionization of argon in an analytical capacitively coupled radio- frequency glow discharge [J]. J. Appl. Phys., 1999, 86: 6.

[9] Bogaerts A. Hybrid Monte Carlo-fluid model for studying the effects of nitrogen addition to argon glow discharges [J]. Spectrochimica Acta., 2009, 64(2): 126–140.

[10] Bogaerts A. Effects of oxygen addition to argon glow discharges: a hybrid Monte Carlo-fluid modeling investigation [J]. Spectrochimica Acta., 2009, 64(2): 1266–1279.

[11] Depla D, Heirwegh S. Towards a more complete model for reactive magnetron sputtering [J]. J. Phys. D: Appl. Phys., 2007, 40: 1957–1965.

[12] Nanbu K, Mitsui K. Self-consistent particle modelling of dc magnetron discharges of an O₂/Ar mixture [J]. J. Phys. D: Appl. Phys., 2000, 33: 2274-2283.

[13] Itikawa Y. Cross sections for electron collisions with nitrogen molecules [J]. J. Phys. Chem. Ref. Data, 2006, 35(1): 31-53.

[14] Itikawa Y, Hayashi M. Molecular processes in plasmas: collision of charged particles with molecules [J]. J. Phys. Chem. Ref. Data, 1986, 15: 985.

[15] ItikawaY, Hayashi M, Ichimura A, et al. Cross sections for collisions of electrons and photons with nitrogen [J]. J Phys. Chem. Ref. Data, 1986, 15(3): 985-1010.

[16] Zhang L Z, Yu W, Han L. Generation and distribution of fast atomic species (N⁺, N_f) in nitrogen glow discharge [J]. Plasma Science and Technology, 2006, 8(6): 670- 674.

[17] Hennad A, Yousfi M. Ion collision cross sections with transport and reaction coefficients in Ar, Cl₂ and N₂ and their mixtures for photonic crystal applications [J]. J. Phys. D, 2011, 44(2): 025-201.

N₂-Ar射频放电表面氮化的等离子体特性模拟

N₂-Ar rf discharge surface nitriding plasma characteristics simulation

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