气压对于低气压双频容性耦合Ar/O2 等离子体放电特性影响的研究

doi:10.16568/j.0254-6086.202004013

核聚变与等离子体物理 ›› 2020, Vol. 40 ›› Issue (4): 372-378.DOI: 10.16568/j.0254-6086.202004013

气压对于低气压双频容性耦合Ar/O2 等离子体放电特性影响的研究

吴良超，殷桂琴*，孟祥国，周有有，王兢婧

(西北师范大学物理与电子工程学院，兰州 730070)

收稿日期:2019-04-15 修回日期:2020-04-14 出版日期:2020-12-15 发布日期:2021-06-03
作者简介:吴良超(1993-)，男，甘肃临夏人，硕士研究生，从事低温等离子体物理研究。
基金资助:
国家自然科学基金(11665021)

Study on the effect of atmospheric pressure on the discharge characteristics of capacitively coupled Ar/O2 plasma at low pressure

WU Liang-chao, YIN Gui-qin, MENG Xiang-guo, ZHOU You-you, WANG Jin-jing

(School of Physics and Electronic Engineering, Northwestern Normal University, Lanzhou, 730070)

Received:2019-04-15 Revised:2020-04-14 Online:2020-12-15 Published:2021-06-03
Supported by:

摘要/Abstract

摘要： 研究了气压对双射频氩氧混合等离子体电子温度和电子密度的影响。在13.56MHz低频功率和94.92MHz高频功率固定为60W和氩氧气体比为1:9的情况下，利用发射光谱法分析了气压不同时氩氧混合等离子体的放电光谱中的特征谱线的变化规律。使用一维质点网格法(PIC-MC)静电模型计算了电子温度和电子密度。结果表明：电子温度随着气压的增加先降低后升高，与实验结果趋势相吻合；电子密度随着气压的增加先增大后减小。

关键词: , 双频容性耦合等离子体；发射光谱法；蒙特卡罗碰撞方法；等离子体清洗

Abstract: Influence of gas pressure on electron temperature and electron density of argon-oxygen plasma induced by dual radio frequency (RF) source with a high-frequency of 94.92MHz and a low-frequency of 13.56MHz is studied. Under the condition that the low-frequency power and the high-frequency power are fixed at 60W and the argon-oxygen gas ratio is 1:9, the characteristic lines in the discharge spectrum of the argon-oxygen mixed plasma at different pressures is analyzed. The electron temperature and electron density is simulated with the one-dimensional PIC-MC (Particle-in-cell and Monte-Carlo) electrostatic model. The results show that the electron temperature decreases first and then rises with the increase of air pressure, consistent with the experimental result; the electron density first increases and then decreases with the increase of air pressure.

Key words: Dual-frequency capacitive coupled plasma, Emission spectrometry, Monte Carlo collision method, Plasma cleaning

中图分类号:

O539

吴良超，殷桂琴*，孟祥国，周有有，王兢婧. 气压对于低气压双频容性耦合Ar/O2 等离子体放电特性影响的研究[J]. 核聚变与等离子体物理, 2020, 40(4): 372-378.

WU Liang-chao, YIN Gui-qin, MENG Xiang-guo, ZHOU You-you, WANG Jin-jing. Study on the effect of atmospheric pressure on the discharge characteristics of capacitively coupled Ar/O2 plasma at low pressure[J]. NUCLEAR FUSION AND PLASMA PHYSICS, 2020, 40(4): 372-378.

参考文献

[1]Shi J-j, Michael G Kong. Mode characteristics of raido-frequency atmospheric glow discharge [J]. IEEE Transactions on Plasma Science, 2005, 33(2): 624-630. [2]Li X C, Bao W T. Characteristics of a large gap uniform discharge excited by DC voltage at atmospheric pressure [J]. Chin. Phys. B, 2014, 23(9): 095202-6. [3]Wang H B, Sun W T. Discharge characteristics of atmospheric-pressure radiofrequency glow discharges with argon/nitrogen [J]. Appl. Phys. Lett., 2006, 89(16): 161504-3. [4]Balcon N, Hagelaar G J M. Numerical model of an argon atmospheric pressure RF discharge [J]. IEEE Transactions on Plasma Science, 2008, 36(5): 2782-2787. [5]Li S-z, Wu Q. Development of an atmospheric-pressure homogeneous and cold Ar/O2 plasma source operating in glow discharge [J]. Phys. Plasmas, 2010, 17(06): 20. [6]Guschl P C, Hicks R F. Surface decontamination using atmospheric oxygen-argon plasma [C]. IEEE 35th International Conference on, June 15-19, 2008, Karlsruhe, Germany. 1. [7]Qian M Y, Ren C S. Atmospheric pressure cold argon/oxygen plasma jet assisted by preionization of syringeneedle electrode [J]. Plasma Sci. Techn., 2010, 12: 561-567. [8]王一男, 金鑫. 少量氧气对大气压氩氧混合气体放电特性的影响 [J]. 核聚变与等离子体物理, 2017, 37(4): 482-488. [9]Curley G A. The dynamics of the charged particles in a dual frequency capacitively coupled dielectric etch reactor [D]. Palaiseau France: Ecole Polytechnique, 2008. [10]Karkari S K, Ellingboe A R. Effect of radio-frequency power level: on electron density in a confined two-frequency capacitively-coupled plasma processing tool [J]. Appl. Phys. Lett., 2006, 88: 101501. [11]Chen Z, Donnelly V M, Economou D J. Measurement of electron temperatures and electron energy distribution functions in dual frequency capacitively coupled CF4/O2 plasmas using trace rare gases optical emission spectroscopy [J]. J. Vac. Sci. Techn. A, 2009, 27: 1159-1165. [12]Fridman A, Kennedy L A. Plasma physics and engineering [M]. Boca Raton: CRC Press, 2004. [13]Jia Liu, De-Qi Wen. Experimental and numerical investigations of electron density in low-pressure dual-frequency capacitively coupled oxygen discharges [J]. J. Vac. Sci. Techn. A, 2013, 31: 061308 . [14]Liu Wenyao, Du Yongquan. Spectroscopy diagnostic of dual-frequency capacitively coupled CHF3/Ar plasma [J]. Phys. Plasmas, 2013, 20: 113501. [15]Zhou Y J, Yuan Q H. 2013 Nonequilibrium atmospheric pressure plasma jet using a combination of 50 kHz/2 MHz dual-frequency power sources [J]. Phys. Plasmas, 2013, 20: 113502. [16]Wendt R, Lange H. The density and decay of metastable Xe(3P2) and resonance Xe(3P1) atoms in a single filament of a dielectric barrier discharge [J]. J. Phys. D: Appl. Phys., 1998, 31: 3368-3372. [17]Hilbert C, Gaurand I, Motret O. [OH(X)] measurements by resonant absorption spectroscopy in a pulsed dielectric barrier discharge [J]. J. Appl. Phys., 1999, 85: 7070-7075. [18]Lukas C, Spaan M. Dielectric barrier discharges with steep voltage rise: mapping of atomic nitrogen in single filaments measured by laser-induced fluorescence spectroscopy [J]. Plasma Sources Sci. Techn., 2001, 10: 445?450. [19]Kozlov K V, Wagner H E, Brandenburg R, et al. Spatio-temporally resolved spectroscopic diagnostics of the barrier discharge in air at atmospheric pressure [J]. J. Phys. D: Appl. Phys., 2001: 3164-3176. [20]Carl D A, Hess D W, Lieberman M A. Oxidation of silicon in an electron cyclotron resonance oxygen plasma: Kinetics, physicochemical, and electrical properties [J]. Journal of Vacuum Science & Technology A, 1990, 8: 2924. [21]Birdsall C K, Langdon A B．Plasma physics via computer simulation [M]．Boca Raton: CRC Press, 2004． [22]Kawamura E, Birdsall C K, Vahedi V．Physical and numerical methods of speeding up particle codes and paralleling as applied to RF discharges [J]. Plasma Sources Sci. Techn., 2000, 9(3): 413. [23]Birdsall C K, Langdon A B．Plasma physics via computer simulation [M]．Boca Raton: CRC Press, 2004． [24]Vahedi V, Surendra M．A Monte Carlo collision model for the particle-in-cell method: applications to argon and oxygen discharges [J]．Comput. Phys. Commun., 1995, 87(1): 179-198． [25]Kimura T, Kasugai H. Experiments and global model of inductively coupled rf Ar/N2 discharges [J]. J. Appl. Phys., 2010, 108: 033305 [26]Liu J, Zhang Q Z. Measurements of ion energy distributions in a dual-frequency capacitively coupled plasma for Ar/O2 discharges [J]. J. Phys. D: Appl. Phys., 2013, 46: 235202. [27]Liu W Y, Xu Y. An investigation of Ar metastable state density in low pressure dual-frequency capacitively coupled argon and argon-diluted plasmas [J]. J. Appl. Phys., 2015, 117(2): 023306. [28]Liu J, Weng W Q. Experimental and numerical investiga- tions of electron density in low-pressure dual frequency capacitively coupled oxygen discharges [J]. Journal of Vacuum Science & Technology A, 2013, 31: 061308. [29]Chung T H. Scaling behavior of electronegative rf discharge plasmas [J]. J. Korean Phys. Soc., 1999, 34: 24-28.

气压对于低气压双频容性耦合Ar/O2 等离子体放电特性影响的研究

Study on the effect of atmospheric pressure on the discharge characteristics of capacitively coupled Ar/O2 plasma at low pressure

PDF

可视化

摘要/Abstract

引用本文

使用本文

参考文献

相关文章 15

编辑推荐

Metrics

[1]	王海兵, 宣伟民, 李华俊, 彭建飞, 何金成, 胡浩天, 陈勇, 康莉, HL-M 研制团队. 300MVA 脉冲发电机高压变频器调速装置设计及调试[J]. 核聚变与等离子体物理, 2021, 41(s2): 453-456.
[2]	毛晓惠, 李青, 宣伟民, 王英翘, 夏于洋, 李春林. HL-2M 装置电子回旋共振加热高压电源系统的研制[J]. 核聚变与等离子体物理, 2021, 41(s2): 477-481.
[3]	曹建勇, 魏会领, 耿少飞, HL-M装置NBI研制组. HL-2M 装置 NBI 加热系统规划及束线研究进展 [J]. 核聚变与等离子体物理, 2021, 41(s2): 489-494.
[4]	黄梅, 王贺, 张峰, 陈罡宇, 梁军, 王洁琼, 叶际若, 饶军, 宋绍栋, 等离子体波加热团队. HL-2M 装置电子回旋共振加热及电流驱动系统设计与研制进展[J]. 核聚变与等离子体物理, 2021, 41(s2): 495-499.
[5]	王浩西, 李永高, 李远, 文若楠, 易江, 王再宏, 石中兵, 周艳. HL-2M 装置 CO2 色散干涉仪研制[J]. 核聚变与等离子体物理, 2021, 41(s2): 510-515.
[6]	邓维楚, 石中兵, 施培万, 杨曾辰. HL-2M 装置固态亚毫米波干涉系统研制[J]. 核聚变与等离子体物理, 2021, 41(s2): 533-537.
[7]	任磊磊, 罗萃文, 刘攀乐, 周建, 樊明杰, 韩倩. HL-2M 装置时序控制与数据采集系统设计[J]. 核聚变与等离子体物理, 2021, 41(s2): 553-558.
[8]	潘卫, 兰荆涛, 潘莉, 张刚, 彭媛媛, 曲成海, 梁军, 李欣怡, 赵丽 . HL-2M 实验网络与数据管理系统的设计与实现[J]. 核聚变与等离子体物理, 2021, 41(s2): 559-565.
[9]	潘莉, 潘卫, 李永革, 张鑫, 兰荆涛, 曲成海, 罗萃文, 韩倩, 梁军 . HL-2M 实验数据分析与实时显示系统的设计与实现 [J]. 核聚变与等离子体物理, 2021, 41(s2): 566-571.
[10]	李佳鲜, 张锦华, 李波, 宋啸, 王硕, 薛雷, 郑国尧, HL-M 研制团队. HL-2M 初始放电位形及波形设计[J]. 核聚变与等离子体物理, 2021, 41(s2): 572-578.
[11]	蔡立君, 宋斌斌, 李连才, 徐红兵, 杨泓, 林晨, 毛维成, HL-M 研制团队 . HL-2M 装置主机集成安装工程质量管理[J]. 核聚变与等离子体物理, 2021, 41(s1): 289-294.
[12]	李连才, 蔡立君, 刘宽程, 张龙, 刘德权, 毛维成, 杨青巍, 李强, HL-M 研制团队 . HL-2M 装置主机安装工艺分析与研究[J]. 核聚变与等离子体物理, 2021, 41(s1): 295-299.
[13]	李连才, 蔡立君, 毛维成, 杨青巍, 李强, 王全明, 冯勇进, 李永革, 林晨, 张龙, HL-M研制团队. HL-2M 装置集成安装进度控制研究[J]. 核聚变与等离子体物理, 2021, 41(s1): 300-306.
[14]	邹晖, 李广生, 邱银, 刘晓龙, 刘健, 单亚农, 李强, HL-M 研制团队 . HL-2M 装置极向场线圈的结构设计与制造[J]. 核聚变与等离子体物理, 2021, 41(s1): 307-311.
[15]	刘晓龙, 李广生, 邹晖, 邱银, 单亚农, 蔡立君, 刘健, HL-M 研制团队. HL-2M 装置环向场线圈的工程研制与调试[J]. 核聚变与等离子体物理, 2021, 41(s1): 312-315.